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The ultra-microtome can be used by itself, or combination with soft lithography to achieve greater flexibility. This process is known as Nano skiving and is one of the thriving methods in the field of nanofabrication. Developed by Whiteside and coworkers, Nano skiving is a form of edge lithography used to fabricate nanostructures that are difficult or impossible to generate using other approaches. This technique combines the deposition of thin film with sectioning thin film embedded in a polymer matrix using an ultra-microtome. Compared to conventional methods for nanofabrication, Nano skiving is of efficiency, simplicity and is compatible with soft materials such as conjugated polymers and organic compounds, requiring no special associated tools and clean rooms. Nano skiving involves three major steps known as depositing a thin metallic, semiconducting, or polymeric film onto a substrate; embedding the film in an epoxy or thiol-ene polymer block, and sectioning the block into slabs using an ultra-microtome.
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